ES 45 | Gas analysis for a more productive world
Gas analysis is used to ensure the purity of all critical gases prior to them entering the manufacturing process. This requires the monitoring of the major process impurities at parts-per-trillion( ppt) levels.
There are established and highly effective solutions for accurate trace-level oxygen( O 2
) and moisture( H 2
O) measurements. These include the SERVOPRO DF-560E ULTRA for industry-leading Coulometric analysis of O 2
, the SERVOPRO DF-750 ULTRA for the lowest detection limits of H 2
O, and the SERVOPRO DF-760E ULTRA, which combines these measurements into one device, reducing both space and cost requirements.
These devices exceed the most stringent needs of fabs to monitor both oxygen and moisture.
However, the remaining impurities have, in the past, required several different analyzers to monitor them all, taking up a lot of space and adding to costs – both for initial system set-up and for ongoing operational expenses.
To solve these issues, Servomex experts developed the SERVOPRO NanoChrome, designed to use safe, stable Plasma Emission Detector technology to provide ultra-trace measurements for a range of impurities.
This performance has been further enhanced to create the NanoChrome ULTRA, which offers detection limits meeting the future demands of the semiconductor industry.
These analyzers can be seamlessly integrated into existing quality monitoring systems, or supplied as turnkey system designed to meet specific customer requirements.
Learn more with our updated UHP video: servomex. com / uhp
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