Beam Aperture & Filter Positioning
Challenge:
In lithography and metrology processes, the
precise alignment and filtering of the beam is
directly related to the wafer´s quality. The laser
beam produces photons that are collected via
a gathering mirror and directed via different
apertures to hit, e.g. the reflection mask.
attocube’s Solution:
attocube´s nanopositioners are designed to operate
with low particle generation at high temperatures
and vacuum with nanometer precision. These
features make them the perfect choice for reliable
aperture control under extreme conditions.
Product:
Nanopositioners
• nanometer precision
• UHV compatibility up to 5e -11 mbar
• coarse & fine movement
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