Planarity Detection
Challenge:
During the lithography and metrology processes the wafer
is exposed to extreme environments, fast motions and
multi-dimensional forces. These could cause elastic or
plastic deformation of the wafer which influences the wafers
planarity. Uneven wafers reduce the accuracy of lithography
processes and distract results of metrology analyses.
For example the movement of wafer stages working with
magnetic levitation deforms in direction perpendicular to
the flat surface of the plate. The operating status of the wafer
stage motor influences the level of deformation. To optimize
the operation mode of wafer stages and therefore reduce
the wafer deformation during lithography process, a nanoprecise
and contactless detection of wafer deformation is
required.
attocube’s Solution:
attocube´s laser interferometer IDS3010 is capable of
measuring directly on the wafer or on mirrors to capture
deformations in nanometer range. The miniaturized
design of the sensor heads allows to measure the deformation
at several places on the same wafer to detect
more-dimensional deformations. It can be used under
extreme environmental conditions such as vacuum or
other harsh environments.
Product:
Displacement Sensor IDS3010
• Certified accuracy in
nanometer range
Sensor Heads
• vacuum compatible
• pluggable
• Compatible to
different surfaces
(wafers, mirrors, polished metal…)