QYR Market Research Global Nanoimprint Lithography System market | Page 3

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Nanoimprint lithography is based on surface structuring with a
template consisting of topographic patterns. After imprinting,
the patterns have to be transferred in order to obtain different
functionalities. As lithography method, nanoimprint is fully
compatible to the standard micro-fabrication techniques,
including different transfer processes such as etching, lift-off,
selective re-growth or diffusion. In most cases, a thin layer of
resist is deposited on the substrate and then imprinted, resulting
in a thickness contrast. This may need a further treatment by
reactive ion etching (RIE) to remove the residual resist layer and
to transfer the features into the used substrate material.