J. Eur. Opt. Society-Rapid Publ. 22, 36( 2026) 367
Figure 23. Evaluation of positioning errors during the scan-and-stitch process. The fringe observation system is moved with 10 lm / s in x-direction and is stitched with an overlap of three fringes in y-direction. The recorded image stack is combined into a single image. The wavefront error of the recorded pattern is calculated by using the carrier-frequency method. A Zernike polynomial fit is applied to the inner circle of the reconstructed wavefront error to remove remaining tip and tilt components.
Figure
24. Microscope images and corresponding atomic force microscope( AFM) measurements for photo resist structures with different scan velocities m.( a) Underexposed structures with m = 0.5 mm / s,( b) well exposed structures with m = 0.2 mm / s,( c) overexposed structures with m = 0.1 mm / s.
Figure 25. AFM measurement of a first scan-and-stitch process in photo resist.