Hexa Reports Industry Chemical Vapor Deposition (CVD) Market | Página 2
In the current scenario, industry players are focusing on developing processes for hybrid thin inorganic-organic
deposition films to lower the production costs, thereby driving the semiconductor industry. This trend has led
to increased and tighter supply of titanium compounds in compliance with environmental norms.
CVD equipment was the largest category in 2016 and is expected to maintain a relatively average growth rate
over the forecast period owing to good quality of deposition films obtained from the equipment. CVD services
segment is the fastest growing chemical vapor deposition segment owing to technological advancements in
technologies such as plasma enhanced process, hot-wire and combustion based.
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Further key findings from the report suggest :
The global CVD market was valued at 20.8 billion in 2016 and is expected to grow at a CAGR of 9.8%
from 2017 to 2025
In application segment, microelectronics was the largest consumption center in 2016 and is estimated
to reach a net worth exceeding USD 17.90 billion by 2025
The Asia Pacific chemical vapor deposition market was the largest in 2016 and is anticipated to follow
the same trend over the forecast period, owing to number of developments from end-use industries
across major economies
The technology demand in the solar products (PV modules and solar cells) segment was valued over
USD 390 million in 2016
These technologies are classified on the basis of operating pressure, physical characteristics of vapor
and plasma enhanced chemical vapor deposition
Key players including Veeco Instruments, Inc., Ulvac, Inc., IHI Corporation, Applied Materials Inc. Tokyo
Electron Limited and Adeka Corporationdominates the global market in 2016 with major market share.
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