Figure 13.
GMMPS optionally
displays a wavelength
grid (yellow numbers) for
each spectrum, including
the wavelength interval
(bright blue) cut out by
the detector gaps. Second
order contamination can
also be shown (orange
shaded area).
• Slit placement area accurately measured
(no more lost slits); users to perform the following tasks (among
others):
• Consistent visualization of band- and mi-
cro-shuffling mask designs; • Overlay wavelength grids and display 2nd
order contamination (Figure 13);
• Spectral packing in micro-shuffling mode,
allowing for much greater slit density; • Display individual wavelengths and atomic
line series (optionally redshifted);
• Allowing tilted slits in micro-shuffling
mode (e.g., for faint strong lensing arcs); • Display the wavelength intervals cut out by
the detector gaps;
• Display of required Phase II parameters for
the Observing Tool; • Interactively adjust the central wavelength
to preserve spectral features of interest
(Figure 14).
• Extensive integrated help web pages, also
available online here;
• Simpler and more robust source code in-
stallation.
In addition, accurate mathematical models of
both GMOS spectrographs have been inte-
grated (see the GMOS WaveMapper item on
next page). They pre-
dict accurately (within
a few pixels) where a
certain
wavelength
will fall onto the detec-
tors — as a function
of slit position, cen-
tral wavelength, and
grating. Using these
models and full opti-
cal throughput curves,
the length of the spec-
tra and their location
are accurately known
in advance, allowing
January 2018 / 2017 Year in Review
The new version of GMMPS allows users to
design the masks in a more transparent and
robust manner, and provides a quantitative
and accurate preview of any data obtained.
Figure 14.
The central wavelength
(CWL) of GMOS can now
be adjusted interactively,
guided by the wavelength
displays (see Figure 13).
Optionally, individual
wavelengths and atomic
line series can also be
shown.
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