Extreme ultraviolet lithography ( EUVL ) Equipment Market
The Extreme ultraviolet lithography ( EUVL ) Equipment market can be segmented on the basis of light source as :
Laser pulsed Sn plasma , ArF excimer lasers , Relativistic Vacuum tube free-electron lasers and Synchrotron radiation
In terms of tools , the Extreme ultraviolet lithography ( EUVL ) Equipment market has been segmented across the following :
Vacuum tube , mirrors and multilayer object By end-user , the market has been segmented into following : Foundry , Memory , IDM and Others The market has been segmented based on the following geographies : North America , South America , APAC , Europe , Middle East and Africa
Following are just a few of the companies that are operating in the Extreme ultraviolet lithography ( EUVL ) Equipment market :
ASML , Nikon , Canon , Vistec Semiconductor Systems , NuFlare Technology Inc . and SUSS Microtec AG
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