Extreme ultraviolet lithography( EUVL) Equipment Market
The Extreme ultraviolet lithography( EUVL) Equipment market can be segmented on the basis of light source as:
Laser pulsed Sn plasma, ArF excimer lasers, Relativistic Vacuum tube free-electron lasers and Synchrotron radiation
In terms of tools, the Extreme ultraviolet lithography( EUVL) Equipment market has been segmented across the following:
Vacuum tube, mirrors and multilayer object By end-user, the market has been segmented into following: Foundry, Memory, IDM and Others The market has been segmented based on the following geographies: North America, South America, APAC, Europe, Middle East and Africa
Following are just a few of the companies that are operating in the Extreme ultraviolet lithography( EUVL) Equipment market:
ASML, Nikon, Canon, Vistec Semiconductor Systems, NuFlare Technology Inc. and SUSS Microtec AG
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