Extreme ultraviolet lithography ( EUVL ) Equipment Market Analysis : By Light Source ( Laser pulsed Sn plasma , ArF excimer lasers , Relativistic Vacuum tube free-electron lasers and Synchrotron radiation ); By Tools and By end-user - With Forecast ( 2016-2021 ).
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With the growth of the electronic device industry there has been an increasing demand for more efficient and cost effective production of electronic components to meet the rising demand . The demand for electronics comes from a number of applications which ranges from communication to consumer electronic devices to even sensor devices increases . In this respect , the demand for lithography systems increased considerably . Further to this there has been a trend in miniaturization of devices which would as a result require smaller electronic components . With miniaturization , the need for effective and specific lithography techniques has increased . In order to address this growing demand , extreme ultraviolet lithography systems have been developed .