Extreme ultraviolet lithography( EUVL) Equipment Market Analysis: By Light Source( Laser pulsed Sn plasma, ArF excimer lasers, Relativistic Vacuum tube free-electron lasers and Synchrotron radiation); By Tools and By end-user- With Forecast( 2016-2021).
Browse Our Recent Research on Extreme ultraviolet lithography( EUVL) Equipment Market @ http:// www. marketintelreports. com / report / esr0217 / extreme-ultraviolet-lithography-euvlequipment-market-analysis-by-light-source-laser-pulsed-sn-plasma-arf-excimer-lasers-relativisticvacuum-tube-freeelectron-lasers-and-synchrotron-radiation-by-tools-and-by-enduser--withforecast-20162021
With the growth of the electronic device industry there has been an increasing demand for more efficient and cost effective production of electronic components to meet the rising demand. The demand for electronics comes from a number of applications which ranges from communication to consumer electronic devices to even sensor devices increases. In this respect, the demand for lithography systems increased considerably. Further to this there has been a trend in miniaturization of devices which would as a result require smaller electronic components. With miniaturization, the need for effective and specific lithography techniques has increased. In order to address this growing demand, extreme ultraviolet lithography systems have been developed.