Laser Beam Adjustment
Metrology & Inspection
• Laser Beam Adjustment
Challenge:
During the metrology process in the wafers production the
light or laser beam path have to be precisely and continuously
adjusted to perform the relevant controls over the whole
wafer surface in order to detect imperfections and provide
certain results on the wafer´s quality. There are different
kind of inspections: Un-patterned wafer inspection where
the goal is to identify particles and pattern defects and link
those to a specify position on the wafer. Patterned wafer
inspection which identifies geometry imperfections via
the comparison with a “golden” dye and lastly the reticle
inspection which helps to identify single defects on a wafer
reticle. This last inspection is usually performed by using UV
illumination.
attocube’s Solution:
attocube´s nanopositioners are used in critical, ultra-precise
motion applications due to the superior
accuracy, repeatability and resolution. These unique
features together with high reliability are providing a
solution for a continuous and stable beam alignment
within the metrology process.
Product:
Nanopositioners
• high stability
• goniometer resolution 1 u°
• rotator resolution 10 u°