Semicon
Challenge :
Benefits :
• coarse & fine movement attocube ´ s solution :
Semicon
Beam Aperture & Filter Positioning
Challenge :
In lithography and metrology processes , the precise alignment and filtering of the beam is directly related to the wafer ´ s quality . The laser beam produces photons that are collected via a gathering mirror and directed via different apertures to hit , e . g . the reflection mask .
Benefits :
• nanometer precision
• UHV compatibility down to 5 x 10 -11 mbar
• coarse & fine movement attocube ´ s solution :
attocube ´ s nanopositioners are designed to operate with low particle generation at high temperatures and vacuum with nanometer precision . These features make them the perfect choice for reliable aperture control under extreme conditions .
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